Plant responses to changing environmental stress: Cyclobutyl pyrimidine dimer repair in soybean leaves

Betsy M. Sutherland, Shinnosuke Takayanagi, Joe H. Sullivan, John C. Sutherland

Research output: Contribution to journalArticle

27 Scopus citations

Abstract

We have determined the capacity of soybean seedlings to repair DNA damage by UV doses that do not produce apparent injury in the plants. They remove cyclobutane pyrimidine dimers by both excision and photoreactivation. The rates and relative contributions of these repair processes were determined as a function of initial level of cyclobutyl pyrimidine dimers. Photoreactivation was detected in seedlings at all initial dimer levels. Although excision was not observed at the lowest dimer frequencies, at higher initial dimer levels it was quite effective in dimer removal. The rates of repair in soybean were substantially higher than in alfalfa seedlings at the same DNA damage levels.

Original languageEnglish (US)
Pages (from-to)464-468
Number of pages5
JournalPhotochemistry and Photobiology
Volume64
Issue number3
DOIs
Publication statusPublished - Jan 1 1996
Externally publishedYes

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ASJC Scopus subject areas

  • Biochemistry
  • Physical and Theoretical Chemistry

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