Plant responses to changing environmental stress: Cyclobutyl pyrimidine dimer repair in soybean leaves

Betsy M. Sutherland, Shinnosuke Takayanagi, Joe H. Sullivan, John C. Sutherland

Research output: Contribution to journalArticle

27 Citations (Scopus)

Abstract

We have determined the capacity of soybean seedlings to repair DNA damage by UV doses that do not produce apparent injury in the plants. They remove cyclobutane pyrimidine dimers by both excision and photoreactivation. The rates and relative contributions of these repair processes were determined as a function of initial level of cyclobutyl pyrimidine dimers. Photoreactivation was detected in seedlings at all initial dimer levels. Although excision was not observed at the lowest dimer frequencies, at higher initial dimer levels it was quite effective in dimer removal. The rates of repair in soybean were substantially higher than in alfalfa seedlings at the same DNA damage levels.

Original languageEnglish (US)
Pages (from-to)464-468
Number of pages5
JournalPhotochemistry and Photobiology
Volume64
Issue number3
DOIs
StatePublished - Jan 1 1996
Externally publishedYes

Fingerprint

Pyrimidine Dimers
soybeans
pyrimidines
Seedlings
Soybeans
Dimers
leaves
Repair
dimers
DNA Damage
Medicago sativa
DNA
alfalfa
deoxyribonucleic acid
damage
cyclobutane
Wounds and Injuries
dosage

ASJC Scopus subject areas

  • Biochemistry
  • Physical and Theoretical Chemistry

Cite this

Plant responses to changing environmental stress : Cyclobutyl pyrimidine dimer repair in soybean leaves. / Sutherland, Betsy M.; Takayanagi, Shinnosuke; Sullivan, Joe H.; Sutherland, John C.

In: Photochemistry and Photobiology, Vol. 64, No. 3, 01.01.1996, p. 464-468.

Research output: Contribution to journalArticle

Sutherland, Betsy M. ; Takayanagi, Shinnosuke ; Sullivan, Joe H. ; Sutherland, John C. / Plant responses to changing environmental stress : Cyclobutyl pyrimidine dimer repair in soybean leaves. In: Photochemistry and Photobiology. 1996 ; Vol. 64, No. 3. pp. 464-468.
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